Cu metallization using a permanent magnet electron cyclotron resonance microwave plasma/sputtering hybrid system

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 14, Issue 3, 1996, Pages 1853-1859

  Gorbatkin, S M ^a   Poker, D B ^a   Rhoades, R L ^a,c   Doughty, C ^a   Berry, L A ^a   Rossnagel, S M ^b  

^a OAK RIDGE NATIONAL LABORATORY   (United States)

^b IBM T J WATSON RESEARCH CENTER   (United States)

^c MOTOROLA INC   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000103030     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.588566     Document Type: Article

References (22)

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