Plasma dynamic in chromium and titanium HIPIMS discharges

Journal of Physics D: Applied Physics

Volumn 41, Issue 1, 2008, Pages

  Vetushka, Alena ^a   Ehiasarian, Arutiun P ^a  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

IONIZATION; LANGMUIR PROBES; MAGNETRON SPUTTERING; PLASMA SOURCES; TRANSPORT PROPERTIES;

DISCHARGE CURRENTS; ELECTRON ENERGY DISTRIBUTION; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS) DISCHARGE; SPUTTERING YIELD;

ELECTRIC DISCHARGES;

EID: 38549105193     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/41/1/015204     Document Type: Article

References (21)

1. Ehiasarian A P, Hovsepian P Eh, Hultman L and Helmersson U 2004 Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique Thin Solid Films 457 270-7
2. DeKoven B M, Ward P R, Weiss R E, Christie D J, Scholl R A, Sproul W D, Tomasel F and Anders A 2003 Carbon thin film deposition using high power pulsed magnetron sputtering 46th Annual Technical Conf. Proceedings of the Society of Vacuum Coaters (San Francisco, CA, 3-8 May 2003) pp 158-65
3. Alami J, Gudmundsson J T, Bohlmark J and Helmersson U 2005 Plasma dynamics in a highly ionized pulsed magnetron discharge Plasma Sources Sci. Technol. 14 525-31
4. Ehiasarian A P, New R, Münz W-D, Hultman L, Helmersson U and Kouznetsov V 2002 Influence of high power densities on the composition of pulsed magnetron plasmas Vacuum 65 147-54
5. Macak K, Kouznetsov V, Schneider J, Helmersson U and Petrov I 2000 Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge J. Vac. Sci. Technol. A 18 1533-7
6. Ehiasarian A P, Wen J G and Petrov I 2007 Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion J. Appl. Phys. 101 054301
7. Kouznetsov V, Macak K, Schneider J M, Helmersson U and Petrov I 1999 A novel pulsed magnetrons sputtering technique utilizing very high target power densities Surf. Coat. Technol. 122 290-3
8. Gudmundsson J T, Alami J and Helmersson U 2002 Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge Surf. Coat. Technol. 161 249-56
9. de Poucques L, Imbert J C, Boisse-Laporte C, Bretagne J, Ganciu M, Teule-Gay L and Touzeau M 2006 Study of the transport of titanium neutrals and ions in the post-discharge of a high power pulsed magnetron sputtering device Plasma Sources Sci. Technol. 15 661-9
10. Stranak V, Adamek P, Blazek J, Spatenka P, Hubicka Z, Tichy M, Hippler R and Wrehde S 2006 Investigation of the time evolution of plasma parameters in a pulsed magnetron discharge Czech. J. Phys. 56 B1364-70
11. Djermanova N, Kiss'ovski Zh and Tsankov Ts 2006 EEDF determination by numerical processing of the probe data in neon dc discharge Contrib. Plasma Phys. 46 312-21
12. Druyvesteyn M J 1930 Z. Phys. 64 781-98
13. Rossnagel S M 1988 Gas density reduction effects in magnetrons J. Vac. Sci. Technol. A 6 19-24
14. Turner G M 1995 Monte Carlo calculations of gas rarefaction in a magnetron sputtering discharge J. Vac. Sci. Technol. A 13 2161-9
15. Anders A, Andersson J, Horwat D and Ehiasarian A 2007 High power impulse magnetron sputtering: current-voltage-time characteristics J. Appl. Phys. at press
16. Gudmundsson J T 2006 The High Power Impulse Magnetron Sputtering discharge: the ionization mechanism 49th Annual Technical Conf. Proceedings (Washington, DC, 22-27 April 2006) pp 329-33
17. Rossnagel S M 1990 Sputtered atom transport processes IEEE Trans. Plasma Sci. 18 878-82
18. Rossnagel S M and Kaufman H R 1987 Induced drift currents in circular planar magnetrons J. Vac. Sci. Technol. A 5 88-91
19. Ehiasarian A P, Aranda Gonzalvo Y and Whitmore T D 2007 Time-resolved ionisation studies of the high power impulse magnetron discharge in mixed argon and nitrogen atmosphere Plasma Process. Polym. 4 S309-13
20. Hecimovic A, Burcalova K and Ehiasarian A P 2007 Origins of ion energy distribution function in high power impulse magnetron sputtering (HIPIMS) plasma discharge J. Phys. D: Appl. Phys. submitted
21. Bäcker H and Bradley J W 2005 Observations of the long-term plasma evolution in a pulsed dc magnetron discharge Plasma Sources Sci. Technol. 14 419-31