Cross-field ion transport during high power impulse magnetron sputtering

Plasma Sources Science and Technology

Volumn 17, Issue 3, 2008, Pages

  Lundin, Daniel ^a   Larsson, Petter ^a   Wallin, Erik ^a   Lattemann, Martina ^a,b   Brenning, Nils ^c   Helmersson, Ulf ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^c ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

DC GENERATORS; DEPOSITION RATES; ELECTROLYSIS; FILM GROWTH; HIGH PERFORMANCE LIQUID CHROMATOGRAPHY; IONS; MAGNETIC FIELDS; MAGNETRONS; MASS SPECTROMETRY; SPUTTER DEPOSITION; TARGETS; THICK FILMS;

ANOMALOUS ELECTRON TRANSPORT; ANOMALOUS TRANSPORT; CIRCULAR MAGNETRON; DIRECT CURRENT MAGNETRON SPUTTERING; ENERGY DISTRIBUTIONS; HIGH ENERGY TAILS; HIGH POWERS; ION TRANSPORTS; MAGNETIC-FIELD LINES; MASS TRANSPORT; SPECTROMETRY MEASUREMENTS; TARGET SURFACES; THIN-FILM GROWTH; TIME-AVERAGED;

MAGNETRON SPUTTERING;

EID: 51849114555     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/3/035021     Document Type: Article

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