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Volumn 38, Issue 11 PART 1, 2010, Pages 3035-3039

Time- and species-resolved plasma imaging as a new diagnostic approach for hipims discharge characterization

Author keywords

Magnetron sputtering; optical emission spectroscopy; optical filters; pulsed plasmas; thin film deposition

Indexed keywords

BACKGROUND GAS; BAND PASS; CHROMIUM EMISSIONS; DIAGNOSTIC APPROACH; EMISSION LINES; FAST IMAGING; HIGH-POWER; OPTICAL EMISSIONS; OPTICAL INTERFERENCE; PLASMA EFFECTS; PLASMA IMAGING; PULSED PLASMA; THIN-FILM DEPOSITIONS; TIME-RESOLVED ANALYSIS; WORKING GAS;

EID: 78349304724     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2010.2064183     Document Type: Conference Paper
Times cited : (19)

References (18)
  • 2
    • 0037134190 scopus 로고    scopus 로고
    • Influence of high power densities on the composition of pulsed magnetron plasmas
    • Apr
    • A. Ehiasarian, R. New, W.-D. Munz, L. Hultman, U. Helmersson, and V. Kouznetsov, "Influence of high power densities on the composition of pulsed magnetron plasmas, " Vacuum, vol. 65, no. 2, pp. 147-154, Apr. 2002.
    • (2002) Vacuum , vol.65 , Issue.2 , pp. 147-154
    • Ehiasarian, A.1    New, R.2    Munz, W.-D.3    Hultman, L.4    Helmersson, U.5    Kouznetsov, V.6
  • 3
    • 77957745027 scopus 로고    scopus 로고
    • Ion flux characteristics in high-power pulsed magnetron sputtering discharges
    • Feb
    • J. Vlček, P. Kudláček, K. Burcalová, and J. Musil, "Ion flux characteristics in high-power pulsed magnetron sputtering discharges, " Europhys. Lett., vol. 77, no. 4, p. 45 002, Feb. 2007.
    • (2007) Europhys. Lett. , vol.77 , Issue.4 , pp. 45-002
    • Vlček, J.1    Kudláček, P.2    Burcalová, K.3    Musil, J.4
  • 5
    • 63749090932 scopus 로고    scopus 로고
    • On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering
    • Jan
    • J. Alami, K. Sarakinos, F. Uslu, and M. Wuttig, "On the relationship between the peak target current and the morphology of chromium nitride thin films deposited by reactive high power pulsed magnetron sputtering, " J. Phys. D, Appl. Phys., vol. 42, no. 1, p. 015 304, Jan. 2009.
    • (2009) J. Phys. D, Appl. Phys. , vol.42 , Issue.1 , pp. 015-304
    • Alami, J.1    Sarakinos, K.2    Uslu, F.3    Wuttig, M.4
  • 7
    • 54049145179 scopus 로고    scopus 로고
    • Advantages of nanocomposite coatings deposited by high power pulse magnetron sputtering technology
    • Jan
    • K. Bobzin, N. Bagcivan, P. Immich, S. Bolz, J. Alami, and R. Cremer, "Advantages of nanocomposite coatings deposited by high power pulse magnetron sputtering technology, " J. Mater. Process. Technol., vol. 209, no. 1, pp. 165-170, Jan. 2009.
    • (2009) J. Mater. Process. Technol. , vol.209 , Issue.1 , pp. 165-170
    • Bobzin, K.1    Bagcivan, N.2    Immich, P.3    Bolz, S.4    Alami, J.5    Cremer, R.6
  • 8
    • 33947318800 scopus 로고    scopus 로고
    • Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion
    • Mar
    • A. Ehiasarian, J. Wen, and I. Petrov, "Interface microstructure engineering by high power impulse magnetron sputtering for the enhancement of adhesion, " J. Appl. Phys., vol. 101, no. 5, p. 054 301, Mar. 2007.
    • (2007) J. Appl. Phys. , vol.101 , Issue.5 , pp. 054-301
    • Ehiasarian, A.1    Wen, J.2    Petrov, I.3
  • 9
    • 67249088898 scopus 로고    scopus 로고
    • Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer
    • May
    • E. Oks and A. Anders, "Evolution of the plasma composition of a high power impulse magnetron sputtering system studied with a time-of-flight spectrometer, " J. Appl. Phys., vol. 105, no. 9, p. 093 304, May 2009.
    • (2009) J. Appl. Phys. , vol.105 , Issue.9 , pp. 093-304
    • Oks, E.1    Anders, A.2
  • 10
    • 70249097378 scopus 로고    scopus 로고
    • Time evolution of ion energies in HIPIMS of chromium plasma discharge
    • Jul
    • A. Hecimovic and A. Ehiasarian, "Time evolution of ion energies in HIPIMS of chromium plasma discharge, " J. Phys. D, Appl. Phys., vol. 42, no. 13, p. 135 209, Jul. 2009.
    • (2009) J. Phys. D, Appl. Phys. , vol.42 , Issue.13 , pp. 135-209
    • Hecimovic, A.1    Ehiasarian, A.2
  • 11
    • 77950023121 scopus 로고    scopus 로고
    • 2 atmospheres
    • Apr
    • 2 atmospheres, " Vacuum, vol. 84, no. 9, pp. 1159-1170, Apr. 2010.
    • (2010) Vacuum , vol.84 , Issue.9 , pp. 1159-1170
    • Greczynski, G.1    Hultman, L.2
  • 12
    • 67650227428 scopus 로고    scopus 로고
    • On the electron energy in the high power impulse magnetron sputtering discharge
    • Jun
    • J. Gudmundsson, P. Sigurjonsson, P. Larsson, D. Lundin, and U. Helmersson, "On the electron energy in the high power impulse magnetron sputtering discharge, " J. Appl. Phys., vol. 105, no. 12, p. 123 302, Jun. 2009.
    • (2009) J. Appl. Phys. , vol.105 , Issue.12 , pp. 123-302
    • Gudmundsson, J.1    Sigurjonsson, P.2    Larsson, P.3    Lundin, D.4    Helmersson, U.5
  • 14
    • 77749280171 scopus 로고    scopus 로고
    • Dynamics of reactive high-power impulse magnetron sputtering discharge studied by time-and space-resolved optical emission spectroscopy and fast imaging
    • Feb
    • M. Hala, N. Viau, O. Zabeida, J. E. Klemberg-Sapieha, and L. Martinu, "Dynamics of reactive high-power impulse magnetron sputtering discharge studied by time-and space-resolved optical emission spectroscopy and fast imaging, " J. Appl. Phys., vol. 107, no. 4, p. 043 305, Feb. 2010.
    • (2010) J. Appl. Phys. , vol.107 , Issue.4 , pp. 043-305
    • Hala, M.1    Viau, N.2    Zabeida, O.3    Klemberg-Sapieha, J.E.4    Martinu, L.5
  • 15
    • 74849100570 scopus 로고    scopus 로고
    • High power pulsed magnetron sputtering: A review on scientific and engineering state of the art
    • Feb
    • K. Sarakinos, J. Alami, and S. Konstantinidis, "High power pulsed magnetron sputtering: A review on scientific and engineering state of the art, " Surf. Coat. Technol., vol. 204, no. 11, pp. 1661-1684, Feb. 2010.
    • (2010) Surf. Coat. Technol. , vol.204 , Issue.11 , pp. 1661-1684
    • Sarakinos, K.1    Alami, J.2    Konstantinidis, S.3
  • 16
    • 48949085939 scopus 로고    scopus 로고
    • OpenFilters: Open-source software for the design, optimization, and synthesis of optical filters
    • May
    • S. Larouche and L. Martinu, "OpenFilters: Open-source software for the design, optimization, and synthesis of optical filters, " Appl. Opt., vol. 47, no. 13, pp. C219-C230, May 2008.
    • (2008) Appl. Opt. , vol.47 , Issue.13
    • Larouche, S.1    Martinu, L.2
  • 17
    • 24644512152 scopus 로고    scopus 로고
    • Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge
    • DOI 10.1088/0022-3727/38/18/015, PII S0022372705908231
    • K. Gylfason, J. Alami, U. Helmersson, and J. Gudmundsson, "Ionacoustic solitary waves in a high power pulsed magnetron sputtering discharge, " J. Phys. D, Appl. Phys., vol. 38, no. 18, pp. 3417-3421, Sep. 2005. (Pubitemid 41277557)
    • (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.18 , pp. 3417-3421
    • Gylfason, K.B.1    Alami, J.2    Helmersson, U.3    Gudmundsson, J.T.4
  • 18
    • 42549157314 scopus 로고    scopus 로고
    • Simulation of neutral particle flow during high power magnetron impulse
    • May
    • S. Kadlec, "Simulation of neutral particle flow during high power magnetron impulse, " Plasma Processes Polym., vol. 4, no. S1, pp. S419-S423, May 2007.
    • (2007) Plasma Processes Polym. , vol.4 , Issue.S1
    • Kadlec, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.