Dual-magnetron open field sputtering system for sideways deposition of thin films

Surface and Coatings Technology

Volumn 204, Issue 14, 2010, Pages 2165-2169

  Aijaz, Asim ^a   Lundin, Daniel ^a   Larsson, Petter ^a   Helmersson, Ulf ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

DCMS; Dual magnetron; HiPIMS; HPPMS; Open field configuration; Sideways deposition

Indexed keywords

DCMS; DIRECT CURRENT MAGNETRON SPUTTERING; DUAL-MAGNETRON; ELECTRON DENSITIES; EMISSION SPECTRUMS; HIGH-POWER; HIGHLY-IONIZED; IONIZED MATERIALS; MAGNETRON SYSTEM; PLASMA DISCHARGE; SEPARATION DISTANCES; SPUTTERED MATERIALS; SPUTTERING CONDITIONS; SPUTTERING SYSTEMS; TUBULAR SUBSTRATES;

DEPOSITION RATES; ELECTRIC DISCHARGES; EMISSION SPECTROSCOPY; MAGNETIC FIELDS; MAGNETRONS; SUBSTRATES; THIN FILMS;

DEPOSITION;

EID: 76349097113     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.11.044     Document Type: Article

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