Temporal evolution of the ion fluxes for various elements in HIPIMS plasma discharge

IEEE Transactions on Plasma Science

Volumn 39, Issue 4 PART 2, 2011, Pages 1154-1164

  Hecimovic, Ante ^a,b   Ehiasarian, Arutiun P ^a  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Plasma density; plasma properties; plasma transport processes

Indexed keywords

ENERGY-RESOLVED MASS SPECTROMETRY; HIGH-POWER; ION ENERGY DISTRIBUTION FUNCTIONS; ION FLUXES; ION MASS; IONIZATION ENERGIES; LIFE SPAN; PLASMA DISCHARGE; PLASMA PROPERTIES; PLASMA TRANSPORT PROCESSES; SPUTTER YIELDS; TEMPORAL EVOLUTION; THIN-FILM DEPOSITIONS; TIME EVOLUTIONS; TIME-RESOLVED; WORKING GAS PRESSURE;

CHROMIUM; DISTRIBUTION FUNCTIONS; IONIZATION OF GASES; MASS SPECTROMETRY; METAL IONS; NIOBIUM; PLASMA DENSITY; PLASMA DEPOSITION; PLASMAS; TITANIUM;

ELECTRIC DISCHARGES;

EID: 79955962030     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2011.2106516     Document Type: Article

References (28)

1. V. Kouznetsov, K. Macak, J. M. Schneider, U. Helmersson, and I. Petrov, "A novel pulsed magnetron sputter technique utilizing very high target power densities," Surf. Coat. Technol., vol. 122, no. 2/3, pp. 290-293, Dec. 1999.
2. A. P. Ehiasarian, P. E. Hovsepian, L. Hultman, and U. Helmersson, "Comparison of microstructure and mechanical properties of chromium nitride-based coatings deposited by high power impulse magnetron sputtering and by the combined steered cathodic arc/unbalanced magnetron technique," Thin Solid Films, vol. 457, no. 2, pp. 270-277, Jun. 2004.
3. A. P. Ehiasarian, W.-. Munz, L. Hultman, U. Helmersson, and I. Petrov, "High power pulsed magnetron sputtered CrNx films," Surf. Coat. Technol., vol. 163/164, pp. 267-272, Jan. 2003. (Pubitemid 36122284)
4. R. Machunze, A. P. Ehiasarian, F. D. Tichelaar, and G. C. A. M. Janssen, "Stress and texture in HIPIMS TiN thin films," Thin Solid Films, vol. 518, no. 5, pp. 1561-1565, Dec. 2009.
5. S. Konstantinidis, A. Hemberg, J. P. Dauchot, and M. Hecq, "Deposition of zinc oxide layers by high-power impulse magnetron sputtering," J. Vac. Sci. Technol. B, Microelectron. Nanometer Struct., vol. 25, no. 3, pp. 19-21, May 2007. (Pubitemid 46872350)
6. A. P. Ehiasarian, R. New, W. Munz, L. Hultman, U. Helmersson, and V. Kouznetsov, "Influence of high power densities on the composition of pulsed magnetron plasmas," Vacuum, vol. 65, no. 2, pp. 147-154, Apr. 2002. (Pubitemid 34284160)
7. J. Bohlmark, J. T. Gudmundsson, J. Alami, M. Latteman, and U. Helmersson, "Spatial electron density distribution in a high-power pulsed magnetron discharge," IEEE Trans. Plasma Sci., vol. 33, no. 2, pp. 346-347, Apr. 2005. (Pubitemid 40679407)
8. J. Bohlmark, M. Lattemann, J. T. Gudmundsson, A. P. Ehiasarian, Y. A. Gonzalvo, N. Brenning, and U. Helmersson, "The ion energy distributions and ion flux composition from a high power impulse magnetron sputtering discharge," Thin Solid Films, vol. 515, no. 4, pp. 1522-1526, Dec. 2006. (Pubitemid 44716061)
9. A. Hecimovic, K. Burcalova, and A. P. Ehiasarian, "Origins of ion energy distribution function (IEDF) in high power impulse magnetron sputtering (HIPIMS) plasma discharge," J. Phys. D, Appl. Phys., vol. 41, no. 9, p. 095203, May 2008.
10. J. Vlcek, A. D. Pajdarova, and J. Musil, "Pulsed dc magnetron discharges and their utilization in plasma surface engineering," Contrib. Plasma Phys., vol. 44, no. 5/6, pp. 426-436, Sep. 2004. (Pubitemid 39378867)
11. J. Vlcek, P. Kudlacek, K. Burcalova, and J. Musil, "Ion flux characteristics in high-power pulsed magnetron sputtering discharges," Europhys. Lett., vol. 77, no. 4, p. 5, Feb. 2007.
12. J. Bohlmark, A. P. Ehiasarian, M. Lattemann, J. Alami, and U. Helmersson, "The ion energy distributions in a high power impulse magnetron plasma," in Proc. 48th Annu. Tech. Conf. SVC, Denver, CO, 2005, pp. 470-473.
13. S. Kadlec, C. Quaeyhaegens, G. Knuyt, and L. M. Stals, "Energy distribution of ions in an unbalanced magnetron plasma measured with energy-resolved mass spectrometry," Surf. Coat. Technol., vol. 89, no. 1/2, pp. 177-184, Feb. 1997. (Pubitemid 127421428)
14. L. de Poucques, J. Imbert, C. Boisse-Laporte, J. Bretagne, M. Ganciu, L. Teule-Gay, andM. Touzeau, "Study of the transport of titanium neutrals and ions in the postdischarge of a high power pulsed magnetron sputtering device," Plasma Sources Sci. Technol., vol. 15, no. 4, pp. 661-669, Nov. 2006. (Pubitemid 44679411)
15. J. T. Gudmundsson, J. Alami, and U. Helmersson, "Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge," Surf. Coat. Technol., vol. 161, no. 2/3, pp. 249-256, Dec. 2002. (Pubitemid 35235686)
16. J. Alami, J. T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson, "Plasma dynamics in a highly ionized pulsed magnetron discharge," Plasma Sources Sci. Technol., vol. 14, no. 3, pp. 525-531, Aug. 2005. (Pubitemid 41165132)
17. K. Macak, V. Kouznetsov, J. Schneider, U. Helmersson, and I. Petrov, "Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge," J. Vac. Sci. Technol. A, Vac. Surf. Films, vol. 18, no. 4, pp. 1533-1537, Jul. 2000.
18. M. B. Hopkins and W. G. Graham, "Time-resolved electron energy distribution function measurements in a pulsed magnetic multipole hydrogen discharge," J. Appl. Phys., vol. 69, no. 6, pp. 3461-3466, Mar. 1991.
19. J. T. Gudmundsson, J. Alami, and U. Helmersson, "Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge," Appl. Phys. Lett., vol. 78, no. 22, pp. 3427-3429, May 2001. (Pubitemid 33666781)
20. A. Vetushka and A. P. Ehiasarian, "Plasma dynamic in chromium and titanium HIPIMS discharges," J. Phys. D, Appl. Phys., vol. 41, no. 1, p. 015204, Jan. 2008.
21. P. Vasina, M. Mesko, M. Ganciu, J. Bretagne, C. Boisse-Laporte, L. D. Poucques, and M. Touzeau, "Reduction of transient regime in fast preionized high-power pulsed-magnetron discharge," Europhys. Lett., vol. 72, no. 3, pp. 390-395, Nov. 2005. (Pubitemid 41595896)
22. T. Nakano and S. Baba, "Simulation of particle transport in high pressure sputtering," Vacuum, vol. 51, no. 4, pp. 485-489, Dec. 1998. (Pubitemid 128419326)
23. S. Kadlec, "Simulation of neutral particle flow during high power magnetron impulse," Plasma Process. Polym., vol. 4, pp. S419-S423, Apr. 2007.
24. A. P. Ehiasarian and R. Bugyi, "Industrial size high power impulse magnetron sputtering," in Proc. 47th Annu. Tech. Conf. SVC, Denver, CO, 2005, pp. 486-490.
25. M.W. Thompson, "The energy spectrum of ejected atoms during the high energy sputtering of gold," Philos. Mag., vol. 18, no. 152, pp. 377-414, Aug. 1968.
26. A. Hecimovic and A. P. Ehiasarian, "Time evolution of ion energies in HIPIMS of chromium plasma discharge," J. Phys. D, Appl. Phys., vol. 42, no. 13, p. 135209, Jul. 2009.
27. M. A. Liberman and A. J. Lichtenberg, Principles of Plasma Discharges and Materials Processing. New York: Wiley, 1994.
28. J. Bretagne, W. G. Graham, and M. B. Hopkins, "A comparison of experimental and theoretical electron energy distribution functions in a multicusp ion source," J. Phys. D, Appl. Phys., vol. 24, no. 5, pp. 668- 671, May 1991.