Ion energy and mass distributions of the plasma during modulated pulse power magnetron sputtering

Surface and Coatings Technology

Volumn 203, Issue 24, 2009, Pages 3676-3685

  Lin, J ^a   Moore, J J ^a   Sproul, W D ^a,b   Mishra, B ^a   Rees, J A ^c   Wu, Z ^a   Chistyakov, R ^d   Abraham, B ^d  

^a Department of Geology and Geological Engineering   (United States)

^b Reactive Sputtering INC   (United States)

^c HIDEN ANALYTICAL LTD   (United Kingdom)

^d Zpulser LLC   (United States)

Author keywords

High power pulsed magnetron sputtering (HPPMS); Ion energy distribution; Ion flux; Ion mass distribution; Modulated pulse power (MPP); Plasma diagnostics

Indexed keywords

HIGH POWER PULSED MAGNETRON SPUTTERING (HPPMS); ION ENERGY DISTRIBUTION; ION FLUX; ION MASS DISTRIBUTION; MODULATED PULSE POWER (MPP);

ARGON; CHROMIUM; DC GENERATORS; ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; ION BEAMS; MAGNETRON SPUTTERING; MAGNETRONS; MASS SPECTROMETRY; PLASMA DIAGNOSTICS; PLASMA PROBES; PLASMA SOURCES; TARGETS;

IONS;

EID: 67649970491     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2009.05.048     Document Type: Article

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