High-energy ions and atoms sputtered and reflected from a magnetron source for deposition of magnetic thin films

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 23, Issue 4, 2005, Pages 671-675

  Matsui, Hiroki ^a   Toyoda, Hirotaka ^a   Sugai, Hideo ^a  

^a NAGOYA UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

MASS SPECTROMETERS; NICKEL; SPUTTERING; SURFACE ROUGHNESS;

ELECTRON-IMPACT IONIZATION; HIGH-ENERGY IONS; MAGNETRON SOURCE;

MAGNETIC THIN FILMS;

EID: 25144525417     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1943452     Document Type: Article

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