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Surface and Coatings Technology

Volumn 161, Issue 2-3, 2002, Pages 249-256

Spatial and temporal behavior of the plasma parameters in a pulsed magnetron discharge

(3) Gudmundsson, J T a Alami, J b Helmersson, U b

a UNIVERSITY OF ICELAND (Iceland)

b LINKÖPING UNIVERSITY (Sweden)

Author keywords

High density plasma; Ionized metal plasma; Ionized sputtering; Pulsed magnetron sputtering; Time evolution

Indexed keywords

CARRIER CONCENTRATION; ELECTRIC DISCHARGES; ELECTRONS;

HIGH ENERGY ELECTRONS;

MAGNETRONS;

COATING; ELECTRON; PLASMA; SPUTTERING;

EID: 0037010581 PISSN: 02578972 EISSN: None Source Type: Journal
DOI: 10.1016/S0257-8972(02)00518-2 Document Type: Article

Times cited : (196)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.