Pulsed plasmas for sputtering applications

Surface Engineering

Volumn 20, Issue 3, 2004, Pages 174-176

  Sproul, W D ^a   Christie, D J ^a   Carter, D C ^a   Tomasel, F ^a   Linz, T ^b  

^a Advanced Energy Industries Incorporated   (United States)

^b Advanced Energy Industries GmbH   (Germany)

Author keywords

Arc state; Carbon films; High power pulsed magnetron sputtering; Ionisation

Indexed keywords

CURRENT DENSITY; ELECTRIC INDUCTORS; ENERGY DISSIPATION; IONIZATION; MAGNETRON SPUTTERING; PLASMA APPLICATIONS; THIN FILMS;

ARC STATES; CARBON FILMS; HIGH POWER PULSED MAGNETRON SPUTTERING; PULSE FORMING NETWORKS (PFN);

COATING TECHNIQUES;

EID: 3142752594     PISSN: 02670844     EISSN: None     Source Type: Journal    
DOI: 10.1179/026708404225010711     Document Type: Conference Paper

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