Time-resolved ionisation studies of the high power impulse magnetron discharge in mixed argon and nitrogen atmosphere

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Ehiasarian, Arutiun P ^a   Gonzalvo, Yolanda Aranda ^b   Whitmore, Terry D ^b  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b HIDEN ANALYTICAL LTD   (United Kingdom)

Author keywords

High density plasma; Ion assisted deposition; Ion energy distribution function (IEDF); Magnetron

Indexed keywords

AVERAGE POWER; CONCENTRATION OF; DC OPERATION; DIRECT CURRENT; DUTY CYCLES; ENERGY-RESOLVED MASS SPECTROMETRY; FILM-FORMING SPECIES; HIGH DENSITY PLASMA; HIGH PEAK POWER; HIGH-POWER; ION DEPOSITION; ION ENERGY DISTRIBUTION FUNCTIONS; ION FLUXES; ION MASS; ION-ASSISTED DEPOSITION; IONISATION; MAGNETRON DISCHARGES; MEDIUM FREQUENCIES; MOLECULAR IONS; NITROGEN ATMOSPHERES; PULSED DC MAGNETRON DISCHARGE; PULSED-DC DISCHARGE; REACTIVE ATMOSPHERES; SPUTTERED MATERIALS; SUBSTRATE MATERIAL; TIME-RESOLVED; TOTAL FLUX;

ARGON; DISTRIBUTION FUNCTIONS; ELECTRIC DISCHARGES; ELECTRIC POWER DISTRIBUTION; FILMS; HARD COATINGS; ION BEAMS; IONIZATION; IONS; MAGNETRONS; MASS SPECTROMETRY; PERMITTIVITY; PLASMA DEPOSITION; PLASMAS; SMELTING;

ION BEAM ASSISTED DEPOSITION;

EID: 38549126062     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730806     Document Type: Conference Paper

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