Reactive ionized physical vapor deposition of thin films

EPJ Applied Physics

Volumn 56, Issue 2, 2011, Pages

  Konstantinidis, S ^a   Snyders, R ^a,b  

^a UNIVERSITY OF MONS   (Belgium)

^b MATERIA NOVA RESEARCH CENTER   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ENERGY-RESOLVED MASS SPECTROSCOPY; HIGH-POWER; IONIZED PHYSICAL VAPOR DEPOSITION; NITRIDE THIN FILMS; PLASMA CHEMISTRIES; PLASMA DIAGNOSTIC TECHNIQUES; PLASMA-SURFACE INTERACTIONS; REACTIVE GAS; REACTIVE MAGNETRON SPUTTERING; TIME-RESOLVED EMISSIONS; TITANIUM TARGETS; TITANIUM-BASED;

ABSORPTION SPECTROSCOPY; ARGON; DEPOSITION; INDUCTIVELY COUPLED PLASMA; IONIZATION OF GASES; MASS SPECTROMETRY; NITROGEN; OXIDE FILMS; PLASMA DIAGNOSTICS; PLASMA INTERACTIONS; THIN FILMS; TITANIUM; TITANIUM NITRIDE; TITANIUM OXIDES;

PHYSICAL VAPOR DEPOSITION;

EID: 80555123605     PISSN: 12860042     EISSN: 12860050     Source Type: Journal    
DOI: 10.1051/epjap/2011110199     Document Type: Review

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