Ion flux characteristics and efficiency of the deposition processes in high power impulse magnetron sputtering of zirconium

Journal of Applied Physics

Volumn 108, Issue 6, 2010, Pages

  Lazar, J ^a   Vlcek J ^a   Rezek, J ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON PRESSURE; DEPOSITION PROCESS; DUTY CYCLES; GROUND POTENTIAL; HIGH ENERGY; HIGH POWER IMPULSE MAGNETRON SPUTTERING; ION ENERGY DISTRIBUTIONS; ION FLUXES; MASS SPECTROSCOPY; MODEL CALCULATIONS; REPETITION FREQUENCY; TARGET POWER DENSITY; TIME-AVERAGED; UNBALANCED MAGNETRON; VOLTAGE PULSE; ZIRCONIUM ION;

ARGON; ELECTRIC POTENTIAL; IONS; MASS SPECTROMETRY; SUBSTRATES;

ZIRCONIUM;

EID: 77957740388     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3481428     Document Type: Article

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