Ion composition produced by high power impulse magnetron sputtering discharges near the substrate

Journal of Applied Physics

Volumn 104, Issue 8, 2008, Pages

  Ehiasarian, A P ^a   Vetushka, A ^a   Hecimovic, A ^a   Konstantinidis, S ^b  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b MATERIA NOVA RESEARCH CENTER   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION SPECTROSCOPY; ATOMIC SPECTROSCOPY; DC GENERATORS; DISCHARGE (FLUID MECHANICS); DISTRIBUTION FUNCTIONS; ENERGY TRANSFER; GAS ABSORPTION; IONS; MAGNETRON SPUTTERING; MAGNETRONS; MASS SPECTROMETRY; METAL IONS; METALS; PLASMA DENSITY; PLASMAS; PROBABILITY DENSITY FUNCTION; SPACE PROBES; SUBSTRATES;

ATOMIC ABSORPTION SPECTROSCOPIES; DENSE PLASMAS; DISCHARGE CURRENTS; EFFICIENT ENERGY TRANSFERS; HIGH POWERS; ION COMPOSITIONS; ION ENERGY DISTRIBUTION FUNCTIONS; LANGMUIR PROBE ANALYSES; MASS SPECTROSCOPIES; MAXWELLIAN DISTRIBUTIONS; METAL CONTENTS; METAL ION RATIOS; MONOTONICALLY; PEAK CURRENT DENSITIES; PEAK DISCHARGES; PLASMA COMPOSITIONS; SPUTTERED MATERIALS; THOMPSON;

ELECTRIC DISCHARGES;

EID: 55249122471     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3000446     Document Type: Article

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