CrNx films prepared by DC magnetron sputtering and high-power pulsed magnetron sputtering: A comparative study

IEEE Transactions on Plasma Science

Volumn 38, Issue 11 PART 1, 2010, Pages 3046-3056

  Greczynski, Grzegorz ^a   Jensen, Jens ^a   Hultman, Lars ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

CrNx; high power impulse magnetron sputtering (HiPIMS); high power pulsed magnetron sputtering; magnetron sputtering

Indexed keywords

ATOMIC NITROGEN; AVERAGE POWER; CATHODE POTENTIAL; COMPARATIVE STUDIES; CRIII IONS; CRNX; DC MAGNETRON SPUTTERING; DECREASE LINEARLY; DIRECT-CURRENT MAGNETRONS; EMISSION STRENGTH; FLOW RATIOS; FREE FILMS; GAS COMPOSITIONS; HIGH FLUX; HIGH-IONIZATION; HIGH-POWER; HIGH-POWER PULSE; MICROSTRUCTURE EVOLUTIONS; NANO-INDENTATION HARDNESS; NANOSIZED GRAINS; NITRIDE FORMATION; PULSED MAGNETRON SPUTTERING; RENUCLEATION; SPUTTERED FILMS; SPUTTERING TECHNIQUES; SUBSTRATE BIAS; TARGET MATERIALS; TIME-PERIODS;

ARGON; CHROMIUM; DEPOSITION RATES; FILM PREPARATION; GRAIN GROWTH; IONIZATION OF GASES; IONIZATION POTENTIAL; IONS; MAGNETRON SPUTTERING; NANOINDENTATION; NITRIDES;

DC POWER TRANSMISSION;

EID: 78349266824     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2010.2071885     Document Type: Conference Paper

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