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Journal of Applied Physics

Volumn 108, Issue 12, 2010, Pages

Compression and strong rarefaction in high power impulse magnetron sputtering discharges

(2) Horwat, David a Anders, André b

a INSTITUT JEAN LAMOUR (France)

b UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

A-DENSITY; BACKGROUND PRESSURE; COPPER TARGET; DIFFUSIVE ION TRANSPORT; DISCHARGE PULSE; GAS COMPRESSION; GAS PLASMA; HIGH POWER IMPULSE MAGNETRON SPUTTERING; HIGH PRESSURE; ION SATURATION CURRENT; LOW PRESSURES; METAL PLASMA; PLASMA DENSITY DISTRIBUTIONS; POWER PULSE; TEMPORAL DEVELOPMENT; TIME-RESOLVED;

ARGON; PLASMA DENSITY; PLASMA JETS; PLASMAS; PROBES;

ELECTRIC DISCHARGES;

EID: 78650882671 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3525986 Document Type: Article

Times cited : (83)

References (31)

1
- 33746937174
- Ionized physical vapor deposition (IPVD): A review of technology and applications
- DOI 10.1016/j.tsf.2006.03.033, PII S0040609006004317
- U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, Thin Solid Films 0040-6090 513, 1 (2006). 10.1016/j.tsf.2006.03.033 (Pubitemid 44202356)
- (2006) Thin Solid Films , vol.513 , Issue.1-2 , pp. 1-24
- Helmersson, U.¹ Lattemann, M.² Bohlmark, J.³ Ehiasarian, A.P.⁴ Gudmundsson, J.T.⁵

2
- 77949303224
- edited by R. Wei (Research Signpost, Kerala, India)
- A. Ehiasarian, in Plasma Surface Engineering Research and its Practical Applications, edited by, R. Wei, (Research Signpost, Kerala, India, 2008), pp. 35-86.
- (2008) Plasma Surface Engineering Research and Its Practical Applications , pp. 35-86
- Ehiasarian, A.¹

3
- 74849100570
- 0257-8972,. 10.1016/j.surfcoat.2009.11.013
- K. Sarakinos, J. Alami, and S. Konstantinidis, Surf. Coat. Technol. 0257-8972 204, 1661 (2010). 10.1016/j.surfcoat.2009.11.013
- (2010) Surf. Coat. Technol. , vol.204 , pp. 1661
- Sarakinos, K.¹ Alami, J.² Konstantinidis, S.³

4
- 77957745027
- 0295-5075,. 10.1209/0295-5075/77/45002
- J. Vlček, P. Kudláček, K. Burcalová, and J. Musil, EPL 0295-5075 77, 45002 (2007). 10.1209/0295-5075/77/45002
- (2007) EPL , vol.77 , pp. 45002
- Vlček, J.¹ Kudláček, P.² Burcalová, K.³ Musil, J.⁴

5
- 51849114555
- 0963-0252,. 10.1088/0963-0252/17/3/035021
- D. Lundin, P. Larsson, E. Wallin, M. Lattemann, N. Brenning, and U. Helmersson, Plasma Sources Sci. Technol. 0963-0252 17, 035021 (2008). 10.1088/0963-0252/17/3/035021
- (2008) Plasma Sources Sci. Technol. , vol.17 , pp. 035021
- Lundin, D.¹ Larsson, P.² Wallin, E.³ Lattemann, M.⁴ Brenning, N.⁵ Helmersson, U.⁶

6
- 77749280171
- 0021-8979,. 10.1063/1.3305319
- M. Hala, N. Viau, O. Zabeida, J. E. Klemberg-Sapieha, and L. Martinu, J. Appl. Phys. 0021-8979 107, 043305 (2010). 10.1063/1.3305319
- (2010) J. Appl. Phys. , vol.107 , pp. 043305
- Hala, M.¹ Viau, N.² Zabeida, O.³ Klemberg-Sapieha, J.E.⁴ Martinu, L.⁵

7
- 78650865939
- The physics of high power impulse magnetron sputtering
- 0257-8972 (to be published).
- A. Anders, " The physics of high power impulse magnetron sputtering.," Surf. Coat. Technol. 0257-8972 (to be published).
- Surf. Coat. Technol.
- Anders, A.¹

8
- 84957350583
- Sustained self-sputtering using a direct current magnetron source
- DOI 10.1116/1.578679
- W. M. Posadowski and Z. Radzimski, J. Vac. Sci. Technol. A 0734-2101 11, 2980 (1993). 10.1116/1.578679 (Pubitemid 24759904)
- (1993) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.11 , Issue.6 , pp. 2980
- Posadowski, W.M.¹ Radzimski, Z.J.²

9
- 50849108159
- 0734-2101,. 10.1116/1.2966436
- A. Wiatrowski, W. M. Posadowski, and Z. J. Radzimski, J. Vac. Sci. Technol. A 0734-2101 26, 1277 (2008). 10.1116/1.2966436
- (2008) J. Vac. Sci. Technol. A , vol.26 , pp. 1277
- Wiatrowski, A.¹ Posadowski, W.M.² Radzimski, Z.J.³

10
- 44849105741
- 0003-6951,. 10.1063/1.2938414
- J. Andersson and A. Anders, Appl. Phys. Lett. 0003-6951 92, 221503 (2008). 10.1063/1.2938414
- (2008) Appl. Phys. Lett. , vol.92 , pp. 221503
- Andersson, J.¹ Anders, A.²

11
- 60349099309
- 0031-9007,. 10.1103/PhysRevLett.102.045003
- J. Andersson and A. Anders, Phys. Rev. Lett. 0031-9007 102, 045003 (2009). 10.1103/PhysRevLett.102.045003
- (2009) Phys. Rev. Lett. , vol.102 , pp. 045003
- Andersson, J.¹ Anders, A.²

12
- 37149012656
- High power impulse magnetron sputtering: Current-voltage-time characteristics indicate the onset of sustained self-sputtering
- DOI 10.1063/1.2817812
- A. Anders, J. Andersson, and A. Ehiasarian, J. Appl. Phys. 0021-8979 102, 113303 (2007). 10.1063/1.2817812 (Pubitemid 350262075)
- (2007) Journal of Applied Physics , vol.102 , Issue.11 , pp. 113303
- Anders, A.¹ Andersson, J.² Ehiasarian, A.³

13
- 39349092361
- 0021-8979,. 10.1063/1.2875523
- A. Anders, J. Andersson, and A. Ehiasarian, J. Appl. Phys. 0021-8979 103, 039901 (2008). 10.1063/1.2875523
- (2008) J. Appl. Phys. , vol.103 , pp. 039901
- Anders, A.¹ Andersson, J.² Ehiasarian, A.³

14
- 48249131648
- 0022-3727,. 10.1088/0022-3727/41/13/135210
- D. Horwat and A. Anders, J. Phys. D: Appl. Phys. 0022-3727 41, 135210 (2008). 10.1088/0022-3727/41/13/135210
- (2008) J. Phys. D: Appl. Phys. , vol.41 , pp. 135210
- Horwat, D.¹ Anders, A.²

15
- 77953883115
- 0022-3727,. 10.1088/0022-3727/43/27/275204
- A. P. Ehiasarian, J. Andersson, and A. Anders, J. Phys. D: Appl. Phys. 0022-3727 43, 275204 (2010). 10.1088/0022-3727/43/27/275204
- (2010) J. Phys. D: Appl. Phys. , vol.43 , pp. 275204
- Ehiasarian, A.P.¹ Andersson, J.² Anders, A.³

16
- 0017926523
- 0022-5355,. 10.1116/1.569429
- W. D. Westwood, J. Vac. Sci. Technol. 0022-5355 15, 1 (1978). 10.1116/1.569429
- (1978) J. Vac. Sci. Technol. , vol.15 , pp. 1
- Westwood, W.D.¹

17
- 78349310049
- M. Steenbeck, Wissenschaftliche Veröffentlichungen aus dem Siemens-Konzern 9, 42 (1930).
- (1930) Wissenschaftliche Veröffentlichungen Aus Dem Siemens-Konzern , vol.9 , pp. 42
- Steenbeck, M.¹

18
- 84950555774
- 0734-2101,. 10.1116/1.574988
- S. M. Rossnagel, J. Vac. Sci. Technol. A 0734-2101 6, 19 (1988). 10.1116/1.574988
- (1988) J. Vac. Sci. Technol. A , vol.6 , pp. 19
- Rossnagel, S.M.¹

19
- 23844498713
- Plasma dynamics in a highly ionized pulsed magnetron discharge
- DOI 10.1088/0963-0252/14/3/015, PII S0963025205000058
- J. Alami, J. T. Gudmundsson, J. Bohlmark, J. Birch, and U. Helmersson, Plasma Sources Sci. Technol. 0963-0252 14, 525 (2005). 10.1088/0963-0252/14/3/ 015 (Pubitemid 41165132)
- (2005) Plasma Sources Science and Technology , vol.14 , Issue.3 , pp. 525-531
- Alami, J.¹ Gudmundsson, J.T.² Bohlmark, J.³ Birch, J.⁴ Helmersson, U.⁵

20
- 24644512152
- Ion-acoustic solitary waves in a high power pulsed magnetron sputtering discharge
- DOI 10.1088/0022-3727/38/18/015, PII S0022372705908231
- K. B. Gylfason, J. Alami, U. Helmersson, and J. T. Gudmundsson, J. Phys. D: Appl. Phys. 0022-3727 38, 3417 (2005). 10.1088/0022-3727/38/18/015 (Pubitemid 41277557)
- (2005) Journal of Physics D: Applied Physics , vol.38 , Issue.18 , pp. 3417-3421
- Gylfason, K.B.¹ Alami, J.² Helmersson, U.³ Gudmundsson, J.T.⁴

21
- 78650659478
- 0003-6951,. 10.1063/1.3521264
- D. Horwat and A. Anders, Appl. Phys. Lett. 0003-6951 97, 221501 (2010). 10.1063/1.3521264
- (2010) Appl. Phys. Lett. , vol.97 , pp. 221501
- Horwat, D.¹ Anders, A.²

22
- 78349304875
- 0093-3813,. 10.1109/TPS.2010.2063041
- G. Y. Yushkov and A. Anders, IEEE Trans. Plasma Sci. 0093-3813 38, 3028 (2010). 10.1109/TPS.2010.2063041
- (2010) IEEE Trans. Plasma Sci. , vol.38 , pp. 3028
- Yushkov, G.Y.¹ Anders, A.²

23
- 36448998938
- 0021-8979,. 10.1063/1.356292
- A. Kersch, W. Morokoff, and C. Werner, J. Appl. Phys. 0021-8979 75, 2278 (1994). 10.1063/1.356292
- (1994) J. Appl. Phys. , vol.75 , pp. 2278
- Kersch, A.¹ Morokoff, W.² Werner, C.³

24
- 21844496176
- 0734-2101,. 10.1116/1.579537
- G. M. Turner, J. Vac. Sci. Technol. A 0734-2101 13, 2161 (1995). 10.1116/1.579537
- (1995) J. Vac. Sci. Technol. A , vol.13 , pp. 2161
- Turner, G.M.¹

25
- 33748741872
- Study of the gas rarefaction phenomenon in a magnetron sputtering system
- DOI 10.1016/j.tsf.2005.12.225, PII S0040609005025551
- A. Palmero, H. Rudolph, and F. Habraken, Thin Solid Films 0040-6090 515, 631 (2006). 10.1016/j.tsf.2005.12.225 (Pubitemid 44402584)
- (2006) Thin Solid Films , vol.515 , Issue.SPEC. ISS. , pp. 631-635
- Palmero, A.¹ Rudolph, H.² Habraken, F.H.P.M.³

26
- 33745498762
- Inhomogeneous rarefaction of the process gas in a direct current magnetron sputtering system
- DOI 10.1116/1.2210005, 133604JVA
- F. Jimenez, S. D. Ekpe, and S. K. Dew, J. Vac. Sci. Technol. A 0734-2101 24, 1530 (2006). 10.1116/1.2210005 (Pubitemid 43959199)
- (2006) Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films , vol.24 , Issue.4 , pp. 1530-1534
- Jimenez, F.¹ Ekpe, S.D.² Dew, S.K.³

27
- 0000807120
- 0734-2101,. 10.1116/1.572994
- W. D. Hoffman, J. Vac. Sci. Technol. A 0734-2101 3, 561 (1985). 10.1116/1.572994
- (1985) J. Vac. Sci. Technol. A , vol.3 , pp. 561
- Hoffman, W.D.¹

28
- 70350655961
- 0963-0252,. 10.1088/0963-0252/18/4/045008
- D. Lundin, N. Brenning, D. Jädernäs, P. Larsson, E. Wallin, M. Lattemann, M. A. Raadu, and U. Helmersson, Plasma Sources Sci. Technol. 0963-0252 18, 045008 (2009). 10.1088/0963-0252/18/4/045008
- (2009) Plasma Sources Sci. Technol. , vol.18 , pp. 045008
- Lundin, D.¹ Brenning, N.² Jädernäs, D.³ Larsson, P.⁴ Wallin, E.⁵ Lattemann, M.⁶ Raadu, M.A.⁷ Helmersson, U.⁸

29
- 42549157314
- 1612-8850,. 10.1002/ppa200731101
- S. Kadlec, Plasma Processes Polym. 1612-8850 4, S419 (2007). 10.1002/ppap.200731101
- (2007) Plasma Processes Polym. , vol.4 , pp. 419
- Kadlec, S.¹

30
- 51849114555
- Anomalous electron transport in high power impulse magnetron sputtering
- DOI 10.1088/0963-0252/17/2/025007, PII S0963025208650483
- D. Lundin, U. Helmersson, S. Kirkpatrick, S. Rohde, and N. Brenning, Plasma Sources Sci. Technol. 0963-0252 17, 025007 (2008). 10.1088/0963-0252/17/ 2/025007 (Pubitemid 351643350)
- (2008) Plasma Sources Science and Technology , vol.17 , Issue.2 , pp. 025007
- Lundin, D.¹ Helmersson, U.² Kirkpatrick, S.³ Rohde, S.⁴ Brenning, N.⁵

31
- 57049125614
- edited by R. Behrisch and W. Eckstein (Springer, Berlin), 10.1007/978-3-540-44502-9-5
- H. Gnaser, in Sputtering by Particle Bombardment, edited by, R. Behrisch, and, W. Eckstein, (Springer, Berlin, 2007), pp. 231-328. 10.1007/978-3-540- 44502-9-5
- (2007) Sputtering by Particle Bombardment , pp. 231-328
- Gnaser, H.¹

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