A bulk plasma model for dc and HiPIMS magnetrons

Plasma Sources Science and Technology

Volumn 17, Issue 4, 2008, Pages

  Brenning, N ^a   Axnas I ^a   Raadu, M A ^a   Lundin, D ^b   Helmerson, U ^b  

^a ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^b LINKÖPING UNIVERSITY   (Sweden)

Author keywords

[No Author keywords available]

Indexed keywords

AZIMUTHAL CURRENT; BULK PLASMA; DC SPUTTERING; ELECTRIC FIELD REVERSAL; HALL CURRENT; HIGH-POWER; ORDER OF MAGNITUDE; PLASMA DISCHARGE; POTENTIAL PROFILES; PRESHEATH; SPUTTERED MATERIALS; TARGET MATERIALS; TIME DEVELOPMENT; TRANSVERSE RESISTIVITY;

ELECTRIC FIELD MEASUREMENT; ELECTRIC FIELDS; MAGNETRONS; PLASMA SHEATHS; PRESSURE GRADIENT; TARGETS; UNSTEADY FLOW;

ELECTRIC DISCHARGES;

EID: 67649886160     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/17/4/045009     Document Type: Article

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