Characterization of CNx films prepared by twinned ECR plasma source enhanced DC magnetron sputtering

Thin Solid Films

Volumn 390, Issue 1-2, 2001, Pages 107-112

  Xu, Jun ^a   Deng, Xinlu ^a   Zhang, Jialiang ^a   Lu, Wenqi ^a   Ma, Tengcai ^a  

^a DALIAN UNIVERSITY OF TECHNOLOGY   (China)

Author keywords

Carbon nitride; Discharge characteristics; Magnetron sputtering; MW ECR plasma

Indexed keywords

CARBON NITRIDE; CURRENT VOLTAGE CHARACTERISTICS; ELECTRIC DISCHARGES; ELECTRON CYCLOTRON RESONANCE; FILM PREPARATION; MAGNETRON SPUTTERING; PLASMA SOURCES; TWINNING;

DEPOSITION RATE;

CONDUCTIVE FILMS;

EID: 0035973360     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(01)00926-9     Document Type: Article

References (24)