Fundamentals of pulsed plasmas for materials processing

Surface and Coatings Technology

Volumn 183, Issue 2-3, 2004, Pages 301-311

  Anders, André ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

Pulsed plasma; Pulsed sputtering; Sheath

Indexed keywords

BOUNDARY LAYERS; CURRENT DENSITY; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ION IMPLANTATION; PLASMA APPLICATIONS; PLASMA SHEATHS; SPUTTERING; THIN FILMS;

METAL PLASMA IMMERSION; SELF-SPUTTERING;

SURFACE TREATMENT;

COATING;

EID: 2442461050     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2003.09.049     Document Type: Article

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