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Journal of Applied Physics

Volumn 108, Issue 6, 2010, Pages

Spatial and temporal evolution of ion energies in high power impulse magnetron sputtering plasma discharge

(2) Hecimovic, A a Ehiasarian, A P a

a SHEFFIELD HALLAM UNIVERSITY (United Kingdom)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITED COATINGS; DEPOSITION TECHNOLOGY; ENERGY DISTRIBUTIONS; ENERGY-RESOLVED MASS SPECTROSCOPY; FULL SCALE; HIGH POWER IMPULSE MAGNETRON SPUTTERING; HIGH-POWER; INDUSTRIAL COATINGS; INDUSTRIAL MACHINES; ION ENERGIES; ION ENERGY DISTRIBUTION FUNCTIONS; LIFE SPAN; PLASMA DISCHARGE; PULSE PERIOD; SHORT PULSE; SUBSTRATE HOLDERS; TEMPORAL EVOLUTION; TIME RESOLVED MEASUREMENT; WORKING GAS PRESSURE;

COATINGS; DISTRIBUTION FUNCTIONS; ELECTRIC POWER DISTRIBUTION; ION BEAMS; MASS SPECTROMETERS; MASS SPECTROMETRY; METAL IONS; TITANIUM;

ELECTRIC DISCHARGES;

EID: 77957724259 PISSN: 00218979 EISSN: None Source Type: Journal
DOI: 10.1063/1.3486018 Document Type: Article

Times cited : (54)

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