HiPIMS ion energy distribution measurements in reactive mode

IEEE Transactions on Plasma Science

Volumn 38, Issue 11 PART 1, 2010, Pages 3089-3094

  Jouan, Pierre Yves ^a   Le Brizoual, Laurent ^a   Ganciu, Miha ^b,c   Cardinaud, Christophe ^a   Tricot, Sylvain ^a   Djouadi, Mohamed Abdou ^a  

^a INSTITUT DES MATÉRIAUX JEAN ROUXEL   (France)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c UNIVERSITÉ PARIS SUD   (France)

Author keywords

Aluminum nitride; high power impulse magnetron sputtering (HiPIMS); mass spectrometry

Indexed keywords

ALUMINUM NITRIDE; MAGNETRON SPUTTERING; MASS SPECTROMETRY; PLASMA SOURCES;

ALUMINUM TARGET; CONVENTIONAL MAGNETRON SPUTTERING; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); IMPULSE SEQUENCES; ION ENERGY DISTRIBUTIONS; ION FLUXES; ORDERS OF MAGNITUDE; TIME RESOLVED MEASUREMENT;

IONS;

EID: 78349310539     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2010.2073688     Document Type: Conference Paper

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