Carbon Thin Film Deposition Using High Power Pulsed Magnetron Sputtering

Proceedings, Annual Technical Conference - Society of Vacuum Coaters

Volumn , Issue , 2003, Pages 158-165

  DeKoven, B M ^a   Ward, P R ^a   Weiss, R E ^a   Christie, D J ^b   Scholl, R A ^b   Sproul, W D ^b   Tomasel, F ^b   Anders, A ^c  

^a Intevac Inc   (United States)

^b Advanced Energy Industries Incorporated   (United States)

^c LAWRENCE BERKELEY NATIONAL LABORATORY   (United States)

Author keywords

Carbon deposition; High density coating; High power pulsed magnetron sputtering; Plasma

Indexed keywords

CARBON; ELECTRIC DISCHARGES; FILM GROWTH; MAGNETRON SPUTTERING; PLASMA DENSITY;

HIGH DENSITY COATINGS;

THIN FILMS;

EID: 0242322434     PISSN: 07375921     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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