Transition between the discharge regimes of high power impulse magnetron sputtering and conventional direct current magnetron sputtering

Plasma Sources Science and Technology

Volumn 18, Issue 4, 2009, Pages

  Lundin, Daniel ^a   Brenning, Nils ^b   Jädernäs, Daniel ^a   Larsson, Petter ^a   Wallin, Erik ^a   Lattemann, Martina ^c,d   Raadu, Michael A ^b   Helmersson, Ulf ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^c DARMSTADT UNIVERSITY OF TECHNOLOGY   (Germany)

^d KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

APPLIED VOLTAGES; CURRENT BEHAVIORS; DIRECT CURRENT MAGNETRON SPUTTERING; DISCHARGE PULSE; DISCHARGE REGIMES; GAS PRESSURES; HIGH-CURRENT; HIGH-POWER; HIGH-VOLTAGES; NEGATIVE VOLTAGE; PEAK CURRENTS; PLATEAU CURRENT; WORKING GAS;

MAGNETRON SPUTTERING; MAGNETRONS;

CURRENT VOLTAGE CHARACTERISTICS;

EID: 70350655961     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/18/4/045008     Document Type: Article

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