Power supply with arc handling for high peak power magnetron sputtering

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 22, Issue 4, 2004, Pages 1415-1419

  Christie, D J ^a   Tomasel, F ^a   Sproul, W D ^a   Carter, D C ^a  

^a Advanced Energy Industries Incorporated   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ARCING OPERATIONS; HIGH POWER PULSED MAGNETRON SPUTTERING (HPPSM); PULSE FORMING NETWORKS (PFN); PULSE PLASMA IGNITION;

CAPACITANCE; ELECTRIC ARCS; ELECTRIC CURRENTS; ELECTRIC IMPEDANCE; ELECTRIC POTENTIAL; ELECTRIC POWER SYSTEMS; INDUCTANCE; LASER PULSES; PLASMA APPLICATIONS; PLASMAS; VACUUM;

MAGNETRON SPUTTERING;

EID: 4344616506     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1688365     Document Type: Conference Paper

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