Asymmetric bipolar pulsed DC: The enabling technology for reactive PVD

Surface and Coatings Technology

Volumn 98, Issue 1-3, 1998, Pages 1245-1250

  Sellers, J ^a  

^a Eni E and P   (United States)

Author keywords

Magnetron; PVD; Reactive; Sputter; Thin film

Indexed keywords

EID: 0000301388     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(97)00403-9     Document Type: Article

References (4)

1. S. Schiller, K. Goedicke, J. Reschke, V. Kirchoff, S. Schneider, F. Milde, Pulsed Magnetron DC Sputtering Technology, FhG FEP, ICMCTF. San Diego, CA, 1993, pp. 9-10.
2. J. Fessman, G. Kamschulte, J. Ebbernik, Improved control of TiN coating properties using cathodic arc evaporation with a pulsed bias by W. Olbrich, Surf. Coat. Technol. 49 (1991) 258.
3. J. Schneider, W. Sproul, A. Lefkow, Birl, A. Matthews, U. Hull, Scaleable Process for Pulsed DC Magnetron Sputtering of Non-Conductive Oxides, 39th 1996 SUC Tech. Conf. Proceedings, Philla, PA p.168.
4. Alumina-chromica coatings deposited by reactive magnetron sputtering. J.M. Schneider, W.D. Sproul, Birl, Northwestern University, Evanston IL; J. Sellers, ENI-SW, Austin, TX and A. Mathews, RCSE, Hull University, United Kingdom, 1997 Society of Vacuum Coaters, 40th Technical Conference Proceedings 1997.