Phase tailoring of Ta thin films by highly ionized pulsed magnetron sputtering

Thin Solid Films

Volumn 515, Issue 7-8, 2007, Pages 3434-3438

  Alami, J ^a   Eklund, P ^a   Andersson, J M ^a   Lattemann, M ^a   Wallin, E ^a   Bohlmark, J ^a   Persson, P ^a,b   Helmersson, U ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Thermo Fisher Scientific   (United States)

Author keywords

HPPMS; Ionized PVD; IPVD; Pulsed sputtering

Indexed keywords

IONIZATION; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; SILICON; TANTALUM; X RAY DIFFRACTION ANALYSIS;

ION FLUX; PULSED SCATTERING;

THIN FILMS;

EID: 33846946534     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.10.013     Document Type: Article

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