Pulsed dc magnetron discharge for high-rate sputtering of thin films

Journal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films

Volumn 19, Issue 2, 2001, Pages 420-424

  Musil, J ^a   Lestina J ^a   Vlcek J ^a   Tolg T ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

COPPER; CURRENT VOLTAGE CHARACTERISTICS; METALLIC FILMS; PLASMA APPLICATIONS; SPUTTER DEPOSITION; THIN FILMS;

PULSED MAGNETRON DISCHARGE;

MAGNETRON SPUTTERING;

EID: 0035271894     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.1339018     Document Type: Article

References (11)