메뉴 건너뛰기




Volumn 518, Issue 21, 2010, Pages 5978-5980

Fully dense, non-faceted 111-textured high power impulse magnetron sputtering TiN films grown in the absence of substrate heating and bias

Author keywords

High power impulse magnetron sputtering (HiPIMS); High power pulsed magnetron sputtering (HPPMS); Ion assisted deposition; Nucleation and growth; Pulsed magnetron sputtering; Thin films; Titanium nitride; Transmission electron microscopy

Indexed keywords

AMORPHOUS FILMS; DEPOSITION RATES; GRAIN GROWTH; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; ION BEAM ASSISTED DEPOSITION; METALLIC FILMS; PROBABILITY DISTRIBUTIONS; SILICA; THIN FILMS; TIN; TITANIUM NITRIDE; TRANSMISSION ELECTRON MICROSCOPY;

EID: 77955550328     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.064     Document Type: Letter
Times cited : (114)

References (34)
  • 28
    • 77955550597 scopus 로고    scopus 로고
    • http://www.spss.com.


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.