Hysteresis-free reactive high power impulse magnetron sputtering

Thin Solid Films

Volumn 516, Issue 18, 2008, Pages 6398-6401

  Wallin, E ^a   Helmersson, U ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

Author keywords

Alumina; High power impulse magnetron sputtering; Process modeling; Reactive sputtering

Indexed keywords

EID: 44449150711     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2007.08.123     Document Type: Letter

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