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Volumn 109, Issue 10, 2011, Pages

Influence of high power impulse magnetron sputtering plasma ionization on the microstructure of TiN thin films

Author keywords

[No Author keywords available]

Indexed keywords

ATOMIC NITROGEN; AVERAGE POWER; COLUMN BOUNDARIES; DENSE STRUCTURES; DEPOSITION FLUXES; FILM TEXTURES; FILM-FORMING SPECIES; HIGH QUALITY; HIGH-CONTENT; HIGH-POWER; ION FLUXES; LANGMUIR PROBE MEASUREMENTS; MAGNETRON SPUTTERING PLASMA; NITRIDE FILMS; NITROGEN DISSOCIATION; PEAK CURRENTS; PEAK DISCHARGE; SPECTROMETRY MEASUREMENTS; TIN FILMS; TIN THIN FILMS;

EID: 79958845429     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3579443     Document Type: Conference Paper
Times cited : (116)

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