Structure and properties of high power impulse magnetron sputtering and DC magnetron sputtering CrN and TiN films deposited in an industrial scale unit

Thin Solid Films

Volumn 518, Issue 19, 2010, Pages 5558-5564

  Paulitsch, J ^a   Schenkel, M ^b   Zufraß, Th ^b   Mayrhofer, P H ^c   Munz W D ^d  

^a MATERIALS CENTER LEOBEN FORSCHUNG GMBH   (Austria)

^b Systec SVS Vacuum Coating Technologies GmbH   (Germany)

^c UNIVERSITY OF LEOBEN   (Austria)

^d SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

Author keywords

CrN; Hybrid HIPIMS DCMS; Planetary rotation; TiN; Up scaling

Indexed keywords

COATINGS; DEPOSITION RATES; ELECTRODES; HARDNESS; MAGNETRON SPUTTERING; ROTATION; TIN; TITANIUM NITRIDE;

DC MAGNETRON SPUTTERING; DEPOSITION TECHNIQUE; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HYBRID HIPIMS/DCMS; MECHANICAL AND TRIBOLOGICAL PROPERTIES; PLANETARY ROTATION; STRUCTURE AND PROPERTIES; UPSCALING;

CHROMIUM COMPOUNDS;

EID: 77955660605     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.05.062     Document Type: Article

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