Self-sputtering runaway in high power impulse magnetron sputtering: The role of secondary electrons and multiply charged metal ions

Applied Physics Letters

Volumn 92, Issue 20, 2008, Pages

  Anders, André ^a  

^a UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION RATES; ELECTRON EMISSION; ELECTRONS; ENERGY BALANCE; METAL IONS;

HIGH POWER IMPULSE; POTENTIAL EMISSION; SECONDARY ELECTRONS; SELF SPUTTERING;

MAGNETRON SPUTTERING;

EID: 44349190279     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2936307     Document Type: Article

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