A phenomenological equilibrium model applicable to high-power pulsed magnetron sputtering

Plasma Sources Science and Technology

Volumn 19, Issue 6, 2010, Pages

  Vlcek J ^a   Burcalova K ^a  

^a UNIVERSITY OF WEST BOHEMIA   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CHAMBER WALLS; DEGREE OF IONIZATION; DEPOSITION CHARACTERISTICS; EQUILIBRIUM MODELS; HIGH-POWER; ION FLUXES; MAGNETIC CONFINEMENT; MAGNETRON SYSTEM; PLASMA BULK; PULSED DC MAGNETRON SPUTTERING; PULSED MAGNETRON SPUTTERING; RATE COEFFICIENTS; SPUTTERED ATOMS; STATE DISCHARGES; TARGET MATERIALS; TARGET POWER DENSITY; TWO-MATERIALS;

ATOMS; DEPOSITION RATES; FILMS; IONIZATION; IONS; MAGNETRON SPUTTERING; TITANIUM; WALLS (STRUCTURAL PARTITIONS);

DC POWER TRANSMISSION;

EID: 78649961705     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/19/6/065010     Document Type: Article

References (54)

1. Kouznetsov V, Macák K, Schneider J M, Helmersson U and Petrov I 1999 Surf. Coat. Technol. 122 290
2. Macák K, Kouznetsov V, Schneider J, Helmersson U and Petrov I 2000 J. Vac. Sci. Technol. A 18 1533
3. Ehiasarian A P, Hovsepian P Eh, Hultman L and Helmersson U 2004 Thin Solid Films 457 270
4. Vlček J, Pajdarová A D and Musil J 2004 Contrib. Plasma Phys. 44 426
5. Konstantinidis S, Dauchot J P, Ganciu M, Ricard A and Hecq M 2006 J. Appl. Phys. 99 013307
6. Alami J, Sarakinos K, Mark G and Wuttig M 2006 Appl. Phys. Lett. 89 154104
7. Vlček J, Kudláček P, Burcalová K and Musil J 2007 J. Vac. Sci. Technol. A 25 42
8. Vašina P, Meško M, Imbert J C, Ganciu M, Boisse-Laporte C, de Poucques L, Touzeau M, Pagnon D and Bretagne J 2007 Plasma Sources Sci. Technol. 16 501
9. Emmerlich J, Mráz S, Snyders R, Jiang K and Schneider J M 2008 Vacuum 82 867
10. Anders A, Andersson J and Ehiasarian A 2007 J. Appl. Phys. 102 113303
11. Anders A, Andersson J and Ehiasarian A 2008 J. Appl. Phys. 103 039901
12. Andersson J and Anders A 2008 Appl. Phys. Lett. 92 221503
13. Sittinger V, Ruske F, Werner W, Jacobs C, Szyszka B and Christie D J 2008 Thin Solid Films 516 5847
14. Helmersson U, Lattemann M, Bohlmark J, Ehiasarian A P and Gudmundsson J T 2006 Thin Solid Films 513 1
15. Posadowski W M and Radzimski Z J 1993 J. Vac. Sci. Technol. A 11 2980
16. Kadlec S and Musil J 1996 Vacuum 47 307
17. Musil J, Rajsky A, Bell A J, Matous? J, C? epera M and Zeman J 1996 J. Vac. Sci. Technol. A 14 2187
18. Radzimski Z J, Hankins O E, Cuomo J J, Posadowski W P and Shingubara S 1997 J. Vac. Sci. Technol. B 15 202
19. Radzimski Z J, Posadowski W P, Rossnagel S M and Shingubara S 1998 J. Vac. Sci. Technol. B 16 1102
20. Posadowski W M 2001 Thin Solid Films 392 201
21. Wiatrowski A, Posadowski W M and Radzimski Z J 2008 J. Vac. Sci. Technol. A 26 1277
22. Christie D J 2005 J. Vac. Sci. Technol. A 23 330
23. Brenning N, Axnäs I, Raadu M A, Lundin D and Helmersson U 2008 Plasma Sources Sci. Technol. 17 045009
24. Sarakinos K, Alami J, Dukwen J, Woerdenweber J and Wuttig M 2008 J. Phys. D: Appl. Phys. 41 215301
25. Vašina P, Meško M, de Poucques L, Bretagne J, Boisse-Laporte C and Touzeau M 2008 Plasma Sources Sci. Technol. 17 035007
26. Anders A 2008 Appl. Phys. Lett. 92 201501
27. Horwat D and Anders A 2008 J. Phys. D: Appl. Phys. 41 135210
28. Andersson J and Anders A 2009 Phys. Rev. Lett. 102 045003
29. Anders A and Yushkov G Y 2009 J. Appl. Phys. 105 073301
30. Oks E and Anders A 2009 J. Appl. Phys. 105 093304
31. Anders A and Oks E 2009 J. Appl. Phys. 106 023306
32. Hecimovic A and Ehiasarian A P 2009 J. Phys. D: Appl. Phys. 42 135209
33. Gudmundsson J T, Sigurjonsson P, Larsson P, Lundin D and Helmersson U 2009 J. Appl. Phys. 105 123302
34. Lundin D, Stahl M, Kersten H and Helmersson U 2009 J. Phys. D: Appl. Phys. 42 185202
35. Lieberman M A and Lichtenberg A J 2005 Principles of Plasma Discharges and Materials Processing 2nd edn (New York: Wiley-Interscience)
36. Buyle G, De Bosscher W, Depla D, Eufinger K, Haemers J and De Gryse R 2003 Vacuum 70 29
37. Costin C, Marques L, Popa G and Gousset G 2005 Plasma Sources Sci. Technol. 14 168
38. Ziegler J F, Ziegler M D and Biersack J P SRIM - 2006.02 (available from http://www.srim.org)
39. Raizer Y P 1991 Gas Discharge Physics (Berlin: Springer)
40. Grigoriev I S and Meilikhov E Z 1997 Handbook of Physical Quantities (Boca Raton, FL: CRC Press)
41. Huheey J E, Keiter E A and Keiter R L 1993 Inorganic Chemistry: Principles of Structure and Reactivity 4th edn (New York: Harper Collins College Publishers)
42. James A M and Lord M P 1992 Macmillan's Chemical and Physical Data (London: Macmillan)
43. Phelps A V and Petrović Z L 1999 Plasma Sources Sci. Technol. 8 R21
44. Donkó Z 2001 Phys. Rev. E 64 026401
45. Kudláček P, Vlček J, Burcalová K and Lukáš J 2008 Plasma Sources Sci. Technol. 17 025010
46. Gudmundsson J T 2007 private communication
47. Bogaerts A, Gijbels R and Carman R J 1998 Spectrochim. Acta B 53 1679
48. Bartlett P L and Stelbovics A T 2004 At. Data Nucl. Data Tables 86 235
49. Musil J, Leština J, Vlček J and Tölg T 2001 J. Vac. Sci. Technol. A 19 420
50. Abrams C F and Graves D B 1999 J. Appl. Phys. 86 2263
51. Kress J D, Hanson D E, Voter A F, Liu C L, Liu X-Y and Coronell D G 1999 J. Vac. Sci. Technol. A 17 2819
52. Kersch A and Hansen U 2002 J. Vac. Sci. Technol. A 20 1284
53. Vlček J 1989 J. Phys. D: Appl. Phys. 22 623
54. Vlček J, Kudláček P, Burcalová K and Musil J 2007 Europhys. Lett. 77 45002