The role of ionized physical vapor deposition in integrated circuit fabrication

Thin Films

Volumn 27, Issue C, 2000, Pages 1-7

  Hopwood, Jeffrey A ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

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Indexed keywords

EID: 2342460744     PISSN: 10794050     EISSN: None     Source Type: Book Series    
DOI: 10.1016/S1079-4050(00)80003-4     Document Type: Article

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