The recycling trap: A generalized explanation of discharge runaway in high-power impulse magnetron sputtering

Journal of Physics D: Applied Physics

Volumn 45, Issue 1, 2012, Pages

  Anders, A ^a   Capek J ^b   Hala M ^b   Martinu, L ^b  

^a UNIVERSITY OF CALIFORNIA   (United States)

^b ÉCOLE POLYTECHNIQUE DE MONTRÉAL   (Canada)

Author keywords

[No Author keywords available]

Indexed keywords

GAS ATOMS; HIGH DENSITY; HIGH-POWER; MAGNETRON DISCHARGES; RUNAWAY CONDITIONS; SPUTTER YIELDS; TIME-DEPENDENT MODELS;

MAGNETIC FIELDS;

RECYCLING;

EID: 83455171706     PISSN: 00223727     EISSN: 13616463     Source Type: Journal    
DOI: 10.1088/0022-3727/45/1/012003     Document Type: Article

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