Ionization enhancement in ionized magnetron sputter deposition

Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films

Volumn 18, Issue 1, 2000, Pages 23-29

  Joo, Junghoon ^a  

^a Kunsan National University   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON; EMISSION SPECTROSCOPY; FAST FOURIER TRANSFORMS; HARMONIC ANALYSIS; ION BOMBARDMENT; IONIZATION; PLASMA PROBES; SILVER; SPUTTER DEPOSITION; THIN FILMS; X RAY DIFFRACTION ANALYSIS;

INDUCTIVELY COUPLED PLASMA; IONIZED MAGNETRON SPUTTER DEPOSITION; OPTICAL EMISSION SPECTROSCOPY; PROBE ANALYSIS;

MAGNETRON SPUTTERING;

EID: 0033690240     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.582153     Document Type: Article

References (2)

1. S. M. Rossnagel, J. J. Cuomo, and W. D. Westwood, Handbook of Plasma Processing Technology (Noyes, Park Ridge, NJ, 1990), Part III, Chap. 6, p. 160.
2. Y. W. Kim, J. Moser, I. Petrov, and J. Greene, J. Vac. Sci. Technol. A 12, 3169 (1994).