Ionized physical vapor deposition of integrated circuit interconnects

Physics of Plasmas

Volumn 5, Issue 5 PART 1, 1998, Pages 1624-1631

  Hopwood, J ^a  

^a NORTHEASTERN UNIVERSITY   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0000332851     PISSN: 1070664X     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.872829     Document Type: Article

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