Time-resolved investigation of dual high power impulse magnetron sputtering with closed magnetic field during deposition of Ti-Cu thin films

Journal of Applied Physics

Volumn 108, Issue 4, 2010, Pages

  Stranak, Vitezslav ^a   Cada, Martin ^b   Hubicka, Zdenek ^b   Tichy, Milan ^c   Hippler, Rainer ^a  

^a UNIVERSITY OF GREIFSWALD   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

[No Author keywords available]

Indexed keywords

CATHODE VOLTAGES; COMPARATIVE STUDIES; CU THIN FILM; DUAL MAGNETRON SPUTTERING; DUTY CYCLES; HIGH POWER IMPULSE MAGNETRON SPUTTERING; ION FLUXES; METALLIC TARGETS; ORDERS OF MAGNITUDE; PLASMA PARAMETER; REPETITION FREQUENCY; SPUTTERED PARTICLES; TIME RESOLVED OPTICAL EMISSION SPECTROSCOPY; TIME-RESOLVED;

DEPOSITION; EMISSION SPECTROSCOPY; MAGNETIC FIELDS; MAGNETRON SPUTTERING; OPTICAL EMISSION SPECTROSCOPY; PLASMA DENSITY; STOICHIOMETRY; THIN FILMS;

COPPER;

EID: 77956306020     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3467001     Document Type: Conference Paper

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