Optimizing efficiency of Ti ionized deposition in HIPIMS

Plasma Sources Science and Technology

Volumn 20, Issue 3, 2011, Pages

  Ross, A E ^a   Sangines R ^a,b   Treverrow, B ^a   Bilek, M M M ^a   McKenzie, D R ^a  

^a UNIVERSITY OF SYDNEY   (Australia)

^b UNIVERSIDAD NACIONAL AUTÓNOMA DE MÉXICO   (Mexico)

Author keywords

[No Author keywords available]

Indexed keywords

DEPOSITION ENERGY; HIGH-POWER; HIGHLY-IONIZED; PLASMA COMPOSITION; POWER DEPENDENCE; PULSE LENGTH; SATURATION POINT; SECONDARY ELECTRONS; TITANIUM TARGETS;

CRYSTAL OSCILLATORS; ELECTRON TEMPERATURE; EMISSION SPECTROSCOPY; ENERGY EFFICIENCY; IONIZATION; OPTICAL EMISSION SPECTROSCOPY; TITANIUM;

PLASMA DEPOSITION;

EID: 79957704450     PISSN: 09630252     EISSN: 13616595     Source Type: Journal    
DOI: 10.1088/0963-0252/20/3/035021     Document Type: Article

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