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Volumn 28, Issue 4, 2010, Pages 783-790

Deposition rates of high power impulse magnetron sputtering: Physics and economics

Author keywords

[No Author keywords available]

Indexed keywords

AVERAGE POWER; CONVENTIONAL SPUTTERING; DISCHARGE CONDITIONS; FILM DENSITY; HIGH CURRENTS; HIGH-POWER; ION ENERGIES; MAGNETIC BALANCE; PARTICLE CONFINEMENT; POWER-LOSSES; REACTIVE GAS; REACTIVE SYSTEM; SELF FIELD; SPUTTERING TECHNOLOGY; SPUTTERING YIELDS; SWITCH MODULES; TARGET SURFACE;

EID: 77954179491     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3299267     Document Type: Conference Paper
Times cited : (196)

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