High power pulsed magnetron sputtered CrNx films

Surface and Coatings Technology

Volumn 163-164, Issue , 2003, Pages 267-272

  Ehiasarian, A P ^a   Munz W D ^a   Hultman, L ^b   Helmersson, U ^b   Petrov, I ^c  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b LINKÖPING UNIVERSITY   (Sweden)

^c University of Illinois at Urbana Champaign   (United States)

Author keywords

Chromium nitride; Ion bombardment; Ion implantation; Pulsed magnetron sputtering

Indexed keywords

CHROMIUM COMPOUNDS; COMPRESSIVE STRENGTH; CRYSTAL DEFECTS; CRYSTAL LATTICES; INTERFACES (MATERIALS); IONIZATION; MAGNETRON SPUTTERING; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; RECRYSTALLIZATION (METALLURGY); STAINLESS STEEL;

METAL ION ETCHING;

THIN FILMS;

CHROMIUM NITRIDE; INORGANIC COATING; ION IMPLANTATION; SPUTTERING;

EID: 0037472626     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(02)00479-6     Document Type: Article

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