Understanding the discharge voltage behavior during reactive sputtering of oxides

Journal of Applied Physics

Volumn 101, Issue 1, 2007, Pages

  Depla, D ^a   Heirwegh, S ^a   Mahieu, S ^a   Haemers, J ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC DISCHARGES; ELECTRON EMISSION; ION BOMBARDMENT; MAGNETRON SPUTTERING; METALLIC COMPOUNDS; OXIDATION; PLASMA APPLICATIONS;

DISCHARGE VOLTAGE; ION INDUCED SECONDARY ELECTRON EMISSION (ISEE); METALLIC TARGET MATERIALS;

ELECTRIC POTENTIAL;

EID: 33846279408     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.2404583     Document Type: Article

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