Cathode current density distributions in high power impulse and direct current magnetron sputtering modes

Plasma Processes and Polymers

Volumn 6, Issue SUPPL. 1, 2009, Pages

  Clarke, Gregory ^a   Mishra, Anurag ^a   Kelly, Peter J ^b   Bradley, James W ^a  

^a UNIVERSITY OF LIVERPOOL   (United Kingdom)

^b MANCHESTER METROPOLITAN UNIVERSITY   (United Kingdom)

Author keywords

HiPIMS; Ion bombardment; Magnetron; Modelling; Pulsed discharges

Indexed keywords

CATHODE CURRENT DENSITY; DC MODE; DIRECT CURRENT MAGNETRON SPUTTERING; ENERGY EFFICIENT; EROSION PROFILES; HIGH-POWER; HIPIMS; INSTANTANEOUS POWER; MEASURED CURRENTS; OPERATING CONDITION; PEAK CURRENTS; PULSED DISCHARGE; SIMPLE MODEL; SPATIAL AND TEMPORAL VARIATION; SPUTTERING RATE;

CURRENT DENSITY; DC POWER TRANSMISSION; IONS; SPUTTERING;

ION BOMBARDMENT;

EID: 77954941762     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200931201     Document Type: Conference Paper

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