Influence of high power densities on the composition of pulsed magnetron plasmas

Vacuum

Volumn 65, Issue 2, 2002, Pages 147-154

  Ehiasarian, A P ^a   New, R ^a   Munz W D ^a   Hultman, L ^b   Helmersson, U ^b   Kouznetsov, V ^c  

^a SHEFFIELD HALLAM UNIVERSITY   (United Kingdom)

^b LINKÖPING UNIVERSITY   (Sweden)

^c Chemfilt R and D AB   (Sweden)

Author keywords

High density plasma; Highly charged metal ions; Ionised metal plasma; Ionised sputtering; Pulsed magnetron sputtering; Time evolution

Indexed keywords

CATHODES; CURRENT VOLTAGE CHARACTERISTICS; DEPOSITION; ELECTRIC ARCS; GLOW DISCHARGES; IONIZATION; MAGNETRON SPUTTERING;

HIGH DENSITY PLASMAS; HIGHLY CHARGED METAL IONS;

PLASMA SOURCES;

EID: 0037134190     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0042-207X(01)00475-4     Document Type: Article

References (15)