On the film density using high power impulse magnetron sputtering

Surface and Coatings Technology

Volumn 205, Issue 2, 2010, Pages 591-596

  Samuelsson, Mattias ^a,b   Lundin, Daniel ^a   Jensen, Jens ^a   Raadu, Michael A ^c   Gudmundsson, Jon Tomas ^d   Helmersson, Ulf ^a  

^a LINKÖPING UNIVERSITY   (Sweden)

^b Impact Coatings AB   (Sweden)

^c ROYAL INSTITUTE OF TECHNOLOGY   (Sweden)

^d UNIVERSITY OF ICELAND   (Iceland)

Author keywords

DCMS; Density; Global plasma model; HiPIMS; HPPMS; RBS

Indexed keywords

DCMS; DENSITY; GLOBAL PLASMA MODEL; HIPIMS; HPPMS; RBS;

CHROMIUM; COATINGS; COPPER; DEPOSITION; DEPOSITION RATES; ELECTRIC DISCHARGES; ION BOMBARDMENT; MAGNETRON SPUTTERING; METAL IONS; PLATINUM; TANTALUM; THIN FILMS; ZIRCONIUM;

SILVER;

EID: 77956436151     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.surfcoat.2010.07.041     Document Type: Article

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