The high power impulse magnetron sputtering discharge as an ionized physical vapor deposition tool

Vacuum

Volumn 84, Issue 12, 2010, Pages 1360-1364

  Gudmundsson, J T ^a  

^a UNIVERSITY OF ICELAND   (Iceland)

Author keywords

Discharge (HiPIMS); High power impulse magnetron sputtering; Ionized physical vapor deposition (IPVD); Plasma parameters; Sputtering

Indexed keywords

CARRIER CONCENTRATION; DEPOSITION; ELECTRIC DISCHARGES; ELECTRON DENSITY MEASUREMENT; FILM GROWTH; IONIZATION; IONIZATION OF GASES; MAGNETRON SPUTTERING; PHYSICAL VAPOR DEPOSITION; PLASMA DEVICES; SPUTTERING;

DEGREE OF IONIZATION; HIGH DENSITY PLASMAS; HIGH POWER IMPULSE MAGNETRON SPUTTERING (HIPIMS); HIGH-ELECTRON-DENSITY; IONIZED PHYSICAL VAPOR DEPOSITION; MAGNETRON SPUTTERING DEVICE; PLASMA PARAMETER; SPUTTERING TECHNIQUES;

VAPOR DEPOSITION;

EID: 77956448048     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2009.12.022     Document Type: Conference Paper

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