Magnetron sputter deposition: Linking discharge voltage with target properties

Thin Solid Films

Volumn 517, Issue 9, 2009, Pages 2825-2839

  Depla, D ^a   Mahieu, S ^a   De Gryse, R ^a  

^a GHENT UNIVERSITY   (Belgium)

Author keywords

Electron emission; Reactive deposition; Sputtering

Indexed keywords

ELECTRON EMISSION; LIGHTNING; SPUTTER DEPOSITION; TARGETS;

COMPOUND LAYERS; DISCHARGE CURRENTS; DISCHARGE PARAMETERS; DISCHARGE VOLTAGES; GAS PRESSURES; MAGNET CONFIGURATIONS; MAGNETRON DISCHARGES; MAGNETRON SPUTTER DEPOSITIONS; MATERIAL PROPERTIES; REACTIVE DEPOSITION; REACTIVE MAGNETRON SPUTTERING; RESEARCH REPORTS; SPUTTERING;

MAGNETRONS;

EID: 60249086930     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2008.11.108     Document Type: Review

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