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Volumn 112, Issue 4, 2012, Pages 2434-2453

Chloride-based CVD growth of silicon carbide for electronic applications

Author keywords

[No Author keywords available]

Indexed keywords

CARBON PRECURSORS; CVD GROWTHS; ELECTRONIC APPLICATION; HOMOEPITAXIAL GROWTH; LIGHT HYDROCARBON; SILICON PRECURSORS;

EID: 84859403629     PISSN: 00092665     EISSN: 15206890     Source Type: Journal    
DOI: 10.1021/cr200257z     Document Type: Review
Times cited : (108)

References (209)
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    • (1998) SI Chemical Data , pp. 115
    • Aylward, G.1    Findlay, T.2
  • 22
    • 75149143677 scopus 로고    scopus 로고
    • Crippa, D. Rode, D. L. Masi, M. Academic Press: London
    • Pozzetti, V. In Silicon Epitaxy, Semiconductors and Semimetals; Crippa, D.; Rode, D. L.; Masi, M., Eds.; Academic Press: London, 2001; Vol. 72, pp 104-105.
    • (2001) Silicon Epitaxy, Semiconductors and Semimetals , vol.72 , pp. 104-105
    • Pozzetti, V.1
  • 23
    • 84859715584 scopus 로고    scopus 로고
    • Crippa, D. Rode, D. L. Masi, M. Academic Press: London
    • Pozzetti, V. In Silicon Epitaxy, Semiconductors and Semimetals; Crippa, D.; Rode, D. L.; Masi, M., Eds.; Academic Press: London, 2001; Vol. 72, p 108.
    • (2001) Silicon Epitaxy, Semiconductors and Semimetals , vol.72 , pp. 108
    • Pozzetti, V.1
  • 25
    • 84859727504 scopus 로고    scopus 로고
    • Crippa, D. Rode, D. L. Masi, M. Academic Press: London
    • Dutartre, D. In Silicon Epitaxy, Semiconductors and Semimetals; Crippa, D.; Rode, D. L.; Masi, M., Eds.; Academic Press: London, 2001; Vol. 72, pp 404-406.
    • (2001) Silicon Epitaxy, Semiconductors and Semimetals , vol.72 , pp. 404-406
    • Dutartre, D.1
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    • private communication.
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  • 200
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    • Previously unpublished data.
    • Nishizawa, S. Previously unpublished data.
    • Nishizawa, S.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.