Step bunching mechanism in chemical vapor deposition of 6H-and 4H-SiC{0001}

Journal of Applied Physics

Volumn 81, Issue 8, 1997, Pages 3494-3500

  Kimoto, Tsunenobu ^a   Itoh, Akira ^a   Matsunami, Hiroyuki ^a   Okano, Tetsuyuki ^b  

^a KYOTO UNIVERSITY   (Japan)

^b Matsushita Technoresearch Inc   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 0001280521     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.365048     Document Type: Article

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