Ultra thin 3C-SiC pseudomorphic films on Si (100) prepared by organometallic CVD with methyltrichlorosilane

Thin Solid Films

Volumn 318, Issue 1-2, 1998, Pages 18-21

  Hofmann, Jens ^a   Veprek, Stan ^a  

^a TECHNICAL UNIVERSITY OF MUNICH   (Germany)

Author keywords

3C SiC; Heteroepitaxial film; Organometallic CVD

Indexed keywords

CHEMICAL VAPOR DEPOSITION; CRYSTAL LATTICES; CRYSTAL ORIENTATION; EPITAXIAL GROWTH; FILM GROWTH; LOW ENERGY ELECTRON DIFFRACTION; ORGANOMETALLICS; SEMICONDUCTING FILMS; SEMICONDUCTING SILICON; SILICON CARBIDE; SURFACE ROUGHNESS;

HETEROEPITAXIAL FILMS;

ULTRATHIN FILMS;

EID: 0032047218     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0040-6090(97)01131-0     Document Type: Article

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